Added Vince Genova, CNF's engineer responsible for analyzing the various results, “This state of the art DRIE system also minimized RIE lag, demonstrated high aspect ratio etching, improved sidewall morphology, and eliminated common artifacts encountered in DRIE. We look forward to the tool's arrival later this year.”
David Lishan, Principal Scientist at Oerlikon Systems, states, “Our collaborations with Cornell goes back nearly a decade and we are pleased to continue working with Cornell to extend the boundaries of MEMS and nanotechnology. This opportunity is another example of Oerlikon's commitment to advanced research.”
OC Oerlikon Management AG
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