'Pattern Development and Grading for Fit' by [TC]²
25 Jul '06
2 min read
[TC]² announces upcoming Pattern Development and Grading for Fit 3-day seminars
Pattern Development – October 18-20, 2006 A prerequisite for Grading for Fit, Pattern Development is a comprehensive course guiding each participant through the process of developing the best patterns for the garment industry.
Learn introductory principles of fit, pattern development, and marker making. Hands-on activities include flat pattern manipulations, fabric critique, and garment investigation. This program is designed for beginning Patternmakers, Specifications and Costing Engineers, Spreaders and Cutters, Sewing Supervisors, and Merchandisers.
Grading for Fit – November 15-17, 2006 Do you want to increase your skills in patternmaking and fitting? Logically follows Pattern Development, a prerequisite for this course in most cases. Attendees should understand patternmaking, general grading principles and basic CAD functions. This program is designed for Patternmakers, Marker Makers, Specification and Costing Engineers, and Graders.
Proper grading ensures good fit of a manufactured garment. Learn basic principles of fit and grading. Hands-on projects include deriving grade rules and manual grading of three basic garment types.
North Carolina based [TC]² drives the future of the global apparel, soft goods, and sewn products industries with research and consulting products and services focused on technology development and supply chain improvement. Our initiatives include the broad investigation and demonstration of supporting technologies; education, training and consulting services to strategically and tactically implement business practices; and research and development of technology voids.
marketing@alchempro.com
