Tokuyama Corporation ("Tokuyama") hereby announces that Hantok Chemicals Co., Ltd. ("Hantok"), an equity-method affiliate of Tokuyama, held a groundbreaking ceremony today in Pyeongtaek, Republic of Korea, for its new Pyeongtaek Plant, which will be a new production facility for tetramethylammonium hydroxide (TMAH), a photoresist developer.Hantok is a joint venture between Tokuyama and LOTTE Chemical Co., Ltd. and has manufactured and sold photoresist developer in Ulsan, Republic of Korea, since 1995. With demand for advanced semiconductors continuing to grow, demand for TMAH used in semiconductor manufacturing processes is also expected to increase further. Hantok aims to increase its current TMAH production capacity by 50% in the future. This expansion will reinforce its stable supply structure for customers and further strengthen its presence in the global market.
Tokuyama Corporation announced that its affiliate Hantok Chemicals has broken ground on a new tetramethylammonium hydroxide (TMAH) plant in Pyeongtaek, South Korea.
The facility will meet rising demand for semiconductor photoresist developers.
Hantok plans to expand TMAH production capacity by 50 per cent, strengthening supply reliability and position in the global semiconductor materials market.
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